Warning: I am able to write to the configuration file: /www/wwwroot/www.laserwort.com/includes/configure.php. This is a potential security risk - please set the right user permissions on this file (read-only, CHMOD 644 or 444 are typical). You may need to use your webhost control panel/file-manager to change the permissions effectively. Contact your webhost for assistance. See this FAQ
SPT offers solutions for Atmospheric Pressure CVD of SiH4 or TEOS based dielectrics. Our patented Watkins Johnson (WJ) linear injector technology enables precise, repeatable deposition of doped or un-doped films with no transient film properties and uniform gap fill across the wafer.
Wafer transport is via a self-cleaning belt conveyor enabling excellent system reliability with the lowest CoO for dielectric gap-fill.
Factory-certified re-manufactured systems are available with the following platform options:
WJ-999 - 3 process chambers for TEOS and hydride processes
WJ-1000 – 4 process chambers for TEOS and hydride processes
Warning: I am able to write to the configuration file: /www/wwwroot/www.laserwort.com/includes/configure.php. This is a potential security risk - please set the right user permissions on this file (read-only, CHMOD 644 or 444 are typical). You may need to use your webhost control panel/file-manager to change the permissions effectively. Contact your webhost for assistance. 
