DILASE 650
HIGH RESOLUTION DIRECT MULTIFUNCTION LASER LITHOGRAPHY SYSTEM
This equipment offers you the possibility to work with one or two writing lasers, to be focused into one to two beam sizes ranging from 1µm to 50 µm. It allows the writing on any type of substrate (photomasks, semiconductors, glass, polymers, crystals, flexible films...) over a surface area as large as 6x6 inches.
