Nanoimprint Module
(featuring NIL Technology)
The OAI Nanoimprint Module System is a modular add-on that may be used on any mask aligner. This innovative technology was developed at Hewlett Packard as a low-cost solution for research and development efforts. It enables the use of high-yield mold release technology and is adaptable to virtually all mask aligner systems.
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This product was added to our catalog on Friday 06 March, 2015.
